Chin. J. Semicond. > 1999, Volume 20 > Issue 10 > 930-935
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硅表面清洗对7nm热SiO_2栅介质可靠性的影响

高文钰 , 刘忠立 , 和致经 , 张永刚 , 梁秀琴 and 梁桂荣

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(10): 930-935
      高文钰, 刘忠立, 和致经, 张永刚, 梁秀琴, 梁桂荣. 硅表面清洗对7nm热SiO_2栅介质可靠性的影响[J]. 半导体学报(英文版), 1999, 20(10): 930-935.
      Citation:
      高文钰, 刘忠立, 和致经, 张永刚, 梁秀琴, 梁桂荣. 硅表面清洗对7nm热SiO_2栅介质可靠性的影响[J]. 半导体学报(英文版), 1999, 20(10): 930-935.
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      • Received Date: 2015-08-19

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