Chin. J. Semicond. > 1995, Volume 16 > Issue 8 > 636-640

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形成SIMOX结构的PIII新技术的研究

闵靖 , P.K.Chu , Y.C.Cheng , J.B.Liu , S.Iyer and N.W.Cheung

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    Received: 19 August 2015 Revised: Online: Published: 01 August 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(8): 636-640
      闵靖, P.K.Chu, Y.C.Cheng, J.B.Liu, S.Iyer, N.W.Cheung. 形成SIMOX结构的PIII新技术的研究[J]. 半导体学报(英文版), 1995, 16(8): 636-640.
      Citation:
      闵靖, P.K.Chu, Y.C.Cheng, J.B.Liu, S.Iyer, N.W.Cheung. 形成SIMOX结构的PIII新技术的研究[J]. 半导体学报(英文版), 1995, 16(8): 636-640.
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      • Received Date: 2015-08-19

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