Chin. J. Semicond. > 1999, Volume 20 > Issue 6 > 525-528

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聚硅烷(紫外光敏材料)的氧等离子体处理特性

谢茂浓 and 傅鹤鉴

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(6): 525-528
      谢茂浓, 傅鹤鉴. 聚硅烷(紫外光敏材料)的氧等离子体处理特性[J]. 半导体学报(英文版), 1999, 20(6): 525-528.
      Citation:
      谢茂浓, 傅鹤鉴. 聚硅烷(紫外光敏材料)的氧等离子体处理特性[J]. 半导体学报(英文版), 1999, 20(6): 525-528.
      shu

      • Received Date: 2015-08-20

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