Chin. J. Semicond. > 1989, Volume 10 > Issue 1 > 72-75
|

CONTENTS

激光结晶a-Si:H SOI离子注入和快速退火

顾清 and 鲍希茂

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2851 Times PDF downloads: 1076 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 January 1989

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1989  >  10(1): 72-75
      顾清, 鲍希茂. 激光结晶a-Si:H SOI离子注入和快速退火[J]. 半导体学报(英文版), 1989, 10(1): 72-75.
      Citation:
      顾清, 鲍希茂. 激光结晶a-Si:H SOI离子注入和快速退火[J]. 半导体学报(英文版), 1989, 10(1): 72-75.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return