Chin. J. Semicond. > 1999, Volume 20 > Issue 6 > 448-451
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硅中氦离子注入所产生的微孔结构的吸杂作用

闵靖 , 朱剑豪 and 吕翔

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(6): 448-451
      闵靖, 朱剑豪, 吕翔. 硅中氦离子注入所产生的微孔结构的吸杂作用[J]. 半导体学报(英文版), 1999, 20(6): 448-451.
      Citation:
      闵靖, 朱剑豪, 吕翔. 硅中氦离子注入所产生的微孔结构的吸杂作用[J]. 半导体学报(英文版), 1999, 20(6): 448-451.
      shu

      • Received Date: 2015-08-20

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