Chin. J. Semicond. > 1999, Volume 20 > Issue 7 > 589-592
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ECR Plasma CVD法淀积808nm大功率半导体激光器光学膜工艺研究

谭满清 and 茅冬生

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    Received: 20 August 2015 Revised: Online: Published: 01 July 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(7): 589-592
      谭满清, 茅冬生. ECR Plasma CVD法淀积808nm大功率半导体激光器光学膜工艺研究[J]. 半导体学报(英文版), 1999, 20(7): 589-592.
      Citation:
      谭满清, 茅冬生. ECR Plasma CVD法淀积808nm大功率半导体激光器光学膜工艺研究[J]. 半导体学报(英文版), 1999, 20(7): 589-592.
      shu

      • Received Date: 2015-08-20

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