Chin. J. Semicond. > 1999, Volume 20 > Issue 5 > 353-357

CONTENTS

图形衬底上应变SiGe/Si超晶格的结构及光致发光研究

司俊杰 , 杨沁清 , 高俊华 , 滕达 , 王启明 , 郭丽伟 and 周均铭

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2730 Times PDF downloads: 1445 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 May 1999

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1999  >  20(5): 353-357
      司俊杰, 杨沁清, 高俊华, 滕达, 王启明, 郭丽伟, 周均铭. 图形衬底上应变SiGe/Si超晶格的结构及光致发光研究[J]. 半导体学报(英文版), 1999, 20(5): 353-357.
      Citation:
      司俊杰, 杨沁清, 高俊华, 滕达, 王启明, 郭丽伟, 周均铭. 图形衬底上应变SiGe/Si超晶格的结构及光致发光研究[J]. 半导体学报(英文版), 1999, 20(5): 353-357.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return