
PAPERS
Abstract: An effective preparation method is proposed for a type of organic/metal Schottky diode.An organic film,3,4∶9,10 perylenetetracarboxylic dianhydride (PTCDA) , and a metal electrode Au are deposited on the ITO respectively with a simple vacuum evaporation technology.The I-V properties of the diode,measured at room temperature,show that the commutating coefficient of the devices reaches 1E4.According to standard Schottky theory and the measurements of capacitance-frequency and capacitance-voltage,we can conclude that the organic Schottky potential is about 0.2~0.3eV.
Key words: Schottky diode, vapor phase deposition, organic film, capacitance-frequency
1 |
Elyes Garoudja, Walid Filali, Slimane Oussalah, Noureddine Sengouga, Mohamed Henini, et al. Journal of Semiconductors, 2020, 41(10): 102401. doi: 10.1088/1674-4926/41/10/102401 |
2 |
Zinc-doped CdS nanoparticles synthesized by microwave-assisted deposition Abideen A. Ibiyemi, Ayodeji O Awodugba, Olusola Akinrinola, Abass A Faremi Journal of Semiconductors, 2017, 38(9): 093002. doi: 10.1088/1674-4926/38/9/093002 |
3 |
Analysis of structural, optical and electrical properties of metal/p-ZnO-based Schottky diode Lucky Agarwal, Shweta Tripathi, P. Chakrabarti Journal of Semiconductors, 2017, 38(10): 104002. doi: 10.1088/1674-4926/38/10/104002 |
4 |
SnS thin films deposited by chemical bath deposition, dip coating and SILAR techniques Sunil H. Chaki, Mahesh D. Chaudhary, M. P. Deshpande Journal of Semiconductors, 2016, 37(5): 053001. doi: 10.1088/1674-4926/37/5/053001 |
5 |
Kamal Zeghdar, Lakhdar Dehimi, Achour Saadoune, Nouredine Sengouga Journal of Semiconductors, 2015, 36(12): 124002. doi: 10.1088/1674-4926/36/12/124002 |
6 |
Hui Wang, Yingxi Niu, Fei Yang, Yong Cai, Zehong Zhang, et al. Journal of Semiconductors, 2015, 36(10): 104006. doi: 10.1088/1674-4926/36/10/104006 |
7 |
Lara Valentic, Nima E. Gorji Journal of Semiconductors, 2015, 36(9): 094012. doi: 10.1088/1674-4926/36/9/094012 |
8 |
V.K. Dwivedi, P. Srivastava, G. Vijaya Prakash Journal of Semiconductors, 2013, 34(3): 033001. doi: 10.1088/1674-4926/34/3/033001 |
9 |
Capacitance-voltage analysis of a high-k dielectric on silicon Davinder Rathee, Sandeep K. Arya, Mukesh Kumar Journal of Semiconductors, 2012, 33(2): 022001. doi: 10.1088/1674-4926/33/2/022001 |
10 |
A. Resfa, Bourzig Y Smahi, Brahimi R Menezla Journal of Semiconductors, 2011, 32(12): 124001. doi: 10.1088/1674-4926/32/12/124001 |
11 |
M. R. Fadavieslam, N. Shahtahmasebi, M. Rezaee-Roknabadi, M. M. Bagheri-Mohagheghi Journal of Semiconductors, 2011, 32(11): 113002. doi: 10.1088/1674-4926/32/11/113002 |
12 |
Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode Chen Fengping, Zhang Yuming, Lü Hongliang, Zhang Yimen, Guo Hui, et al. Journal of Semiconductors, 2011, 32(6): 064003. doi: 10.1088/1674-4926/32/6/064003 |
13 |
Ali Ahaitouf, Abdelaziz Ahaitouf, Jean Paul Salvestrini, Hussein Srour Journal of Semiconductors, 2011, 32(10): 104002. doi: 10.1088/1674-4926/32/10/104002 |
14 |
Electrical characterization of the organic semiconductor Ag/CuPc/Au Schottky diode Mutabar Shah, M. H. Sayyad, Kh. S. Karimov Journal of Semiconductors, 2011, 32(4): 044001. doi: 10.1088/1674-4926/32/4/044001 |
15 |
M. A. Yeganeh, S. H. Rahmatollahpur Journal of Semiconductors, 2010, 31(7): 074001. doi: 10.1088/1674-4926/31/7/074001 |
16 |
Capacitance–voltage characterization of fully silicided gated MOS capacitor Wang Baomin, Ru Guoping, Jiang Yulong, Qu Xinping, Li Bingzong, et al. Journal of Semiconductors, 2009, 30(3): 034002. doi: 10.1088/1674-4926/30/3/034002 |
17 |
High-temperature characteristics of AlxGa1–xN/GaN Schottky diodes Zhang Xiaoling, Li Fei, Lu Changzhi, Xie Xuesong, Li Ying, et al. Journal of Semiconductors, 2009, 30(3): 034001. doi: 10.1088/1674-4926/30/3/034001 |
18 |
Optimized design of 4H-SiC floating junction power Schottky barrier diodes Pu Hongbin, Cao Lin, Chen Zhiming, Ren Jie Journal of Semiconductors, 2009, 30(4): 044001. doi: 10.1088/1674-4926/30/4/044001 |
19 |
Anealing Effect on Cu/ Ni/4H-SiC Schottky Barrier Yang Weifeng, Yang Keqin, Chen Xiaping, Zhang Feng, Wang Liangjun, et al. Chinese Journal of Semiconductors , 2005, 26(S1): 277-280. |
20 |
Design and Fabrication of Schottky Diode with Standard CMOS Process Li Qiang, Wang Junyu, Han Yifeng,and Min Hao Chinese Journal of Semiconductors , 2005, 26(2): 238-242. |
Article views: 3551 Times PDF downloads: 2506 Times Cited by: 0 Times
Received: 20 August 2015 Revised: Online: Published: 01 March 2006
Citation: |
Guo Wenge, Zhang Yancao, Zheng Jianbang, Ren Ju. Investigation of a Type of Organic/Metal Schottky Diode[J]. Journal of Semiconductors, 2006, 27(3): 545-550.
****
Guo W G, Zhang Y C, Zheng J B, Ren J. Investigation of a Type of Organic/Metal Schottky Diode[J]. Chin. J. Semicond., 2006, 27(3): 545.
|
Journal of Semiconductors © 2017 All Rights Reserved 京ICP备05085259号-2