Chin. J. Semicond. > 1986, Volume 7 > Issue 2 > 183-189
|

CONTENTS

Si(111)面氟吸附的研究

唐少平 , 蒋平 and 张开明

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2608 Times PDF downloads: 1301 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 February 1986

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1986  >  7(2): 183-189
      唐少平, 蒋平, 张开明. Si(111)面氟吸附的研究[J]. 半导体学报(英文版), 1986, 7(2): 183-189.
      Citation:
      唐少平, 蒋平, 张开明. Si(111)面氟吸附的研究[J]. 半导体学报(英文版), 1986, 7(2): 183-189.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return