Chin. J. Semicond. > 1983, Volume 4 > Issue 5 > 484-491
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程序控制液相外延炉

邹志膺 , 萨支天 , 邹美琪 , 张庆汉 and 金奉善

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    Received: 20 August 2015 Revised: Online: Published: 01 May 1983

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      Article Navigation >  Journal of Semiconductors  > 1983  >  4(5): 484-491
      邹志膺, 萨支天, 邹美琪, 张庆汉, 金奉善. 程序控制液相外延炉[J]. 半导体学报(英文版), 1983, 4(5): 484-491.
      Citation:
      邹志膺, 萨支天, 邹美琪, 张庆汉, 金奉善. 程序控制液相外延炉[J]. 半导体学报(英文版), 1983, 4(5): 484-491.
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      • Received Date: 2015-08-20

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