Chin. J. Semicond. > 2003, Volume 24 > Issue 12 > 1303-1306
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大气状态下AFM针尖诱导氧化加工Ti膜的机理分析

匡登峰 , 刘庆纲 , 胡小唐 , 郭维廉 and 张世林

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Key words: AFM针尖诱导氧化, 阳极氧化, Ti氧化物, 偏压, 扫描速度

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    Received: 20 August 2015 Revised: Online: Published: 01 December 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(12): 1303-1306
      匡登峰, 刘庆纲, 胡小唐, 郭维廉, 张世林. 大气状态下AFM针尖诱导氧化加工Ti膜的机理分析[J]. 半导体学报(英文版), 2003, 24(12): 1303-1306.
      Citation:
      匡登峰, 刘庆纲, 胡小唐, 郭维廉, 张世林. 大气状态下AFM针尖诱导氧化加工Ti膜的机理分析[J]. 半导体学报(英文版), 2003, 24(12): 1303-1306.
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      • Received Date: 2015-08-20

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