Chin. J. Semicond. > 2004, Volume 25 > Issue 8 > 981-985
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微波等离子体退火制备CoSi_2薄膜

欧阳斯可 , 汪涛 , 戴永兵 , 吴建生 , 何贤昶 and 沈荷生

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Key words: 金属硅化物, 钴, 固相反应, 微波等离子体

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    Received: 19 August 2015 Revised: Online: Published: 01 August 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(8): 981-985
      欧阳斯可, 汪涛, 戴永兵, 吴建生, 何贤昶, 沈荷生. 微波等离子体退火制备CoSi_2薄膜[J]. 半导体学报(英文版), 2004, 25(8): 981-985.
      Citation:
      欧阳斯可, 汪涛, 戴永兵, 吴建生, 何贤昶, 沈荷生. 微波等离子体退火制备CoSi_2薄膜[J]. 半导体学报(英文版), 2004, 25(8): 981-985.
      shu

      • Received Date: 2015-08-19

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