Chin. J. Semicond. > 2002, Volume 23 > Issue 3 > 323-329
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深亚微米隔离技术——浅沟槽隔离工艺

王新柱 , 徐秋霞 , 钱鹤 , 申作成 and 欧文

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Key words: 浅沟槽隔离, 化学机械平坦化, Kink效应, 反窄宽度效应

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(3): 323-329
      王新柱, 徐秋霞, 钱鹤, 申作成, 欧文. 深亚微米隔离技术——浅沟槽隔离工艺[J]. 半导体学报(英文版), 2002, 23(3): 323-329.
      Citation:
      王新柱, 徐秋霞, 钱鹤, 申作成, 欧文. 深亚微米隔离技术——浅沟槽隔离工艺[J]. 半导体学报(英文版), 2002, 23(3): 323-329.
      shu

      • Received Date: 2015-08-19

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