Chin. J. Semicond. > 1996, Volume 17 > Issue 10 > 780-783
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硅基铁电薄膜的制备和特性研究

陈峥，汤庭鳌

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    Received: 18 August 2015 Revised: Online: Published: 01 October 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(10): 780-783
      陈峥，汤庭鳌. 硅基铁电薄膜的制备和特性研究[J]. 半导体学报(英文版), 1996, 17(10): 780-783.
      Citation:
      陈峥，汤庭鳌. 硅基铁电薄膜的制备和特性研究[J]. 半导体学报(英文版), 1996, 17(10): 780-783.
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      • Received Date: 2015-08-18

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