Chin. J. Semicond. > 1997, Volume 18 > Issue 10 > 755-760
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CO_2离化团束辐照Si表面形成SiO_2膜的分析

田民波 , 冯晓东 and 山田公

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1997

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      Article Navigation >  Journal of Semiconductors  > 1997  >  18(10): 755-760
      田民波, 冯晓东, 山田公. CO_2离化团束辐照Si表面形成SiO_2膜的分析[J]. 半导体学报(英文版), 1997, 18(10): 755-760.
      Citation:
      田民波, 冯晓东, 山田公. CO_2离化团束辐照Si表面形成SiO_2膜的分析[J]. 半导体学报(英文版), 1997, 18(10): 755-760.
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      • Received Date: 2015-08-19

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