Chin. J. Semicond. > 2000, Volume 21 > Issue 5 > 473-479
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超薄外延CoSi_2/n-Si的肖特基势垒接触特性

屈新萍 , 茹国平 , 徐蓓蕾 and 李炳宗

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Key words: 硅化钴, 肖特基势垒, 固相外延

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    Received: 20 August 2015 Revised: Online: Published: 01 May 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(5): 473-479
      屈新萍, 茹国平, 徐蓓蕾, 李炳宗. 超薄外延CoSi_2/n-Si的肖特基势垒接触特性[J]. 半导体学报(英文版), 2000, 21(5): 473-479.
      Citation:
      屈新萍, 茹国平, 徐蓓蕾, 李炳宗. 超薄外延CoSi_2/n-Si的肖特基势垒接触特性[J]. 半导体学报(英文版), 2000, 21(5): 473-479.
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      • Received Date: 2015-08-20

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