Chin. J. Semicond. > 2005, Volume 26 > Issue 7 > 1353-1358
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电极结构对硅薄膜生长过程及材料特性的影响

侯国付 , 郭群超 , 任慧志 , 张晓丹 , 薛俊明 , 赵颖 and 耿新华

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Key words: 网状电极, 硅薄膜, 均匀性, 等离子体的发光光谱

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    Received: 18 August 2015 Revised: Online: Published: 01 July 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(7): 1353-1358
      侯国付, 郭群超, 任慧志, 张晓丹, 薛俊明, 赵颖, 耿新华. 电极结构对硅薄膜生长过程及材料特性的影响[J]. 半导体学报(英文版), 2005, 26(7): 1353-1358.
      Citation:
      侯国付, 郭群超, 任慧志, 张晓丹, 薛俊明, 赵颖, 耿新华. 电极结构对硅薄膜生长过程及材料特性的影响[J]. 半导体学报(英文版), 2005, 26(7): 1353-1358.
      shu

      • Received Date: 2015-08-18

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