Chin. J. Semicond. > 1998, Volume 19 > Issue 2 > 123-126
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IC制造中真实缺陷轮廓的分形特征

姜晓鸿 , 郝跃 , 许冬岗 and 徐国华

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(2): 123-126
      姜晓鸿, 郝跃, 许冬岗, 徐国华. IC制造中真实缺陷轮廓的分形特征[J]. 半导体学报(英文版), 1998, 19(2): 123-126.
      Citation:
      姜晓鸿, 郝跃, 许冬岗, 徐国华. IC制造中真实缺陷轮廓的分形特征[J]. 半导体学报(英文版), 1998, 19(2): 123-126.
      shu

      • Received Date: 2015-08-20

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