Chin. J. Semicond. > 2004, Volume 25 > Issue 5 > 583-588

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Key words: 侧墙图形转移技术, 固相扩散, 源漏扩展区

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    Received: 19 August 2015 Revised: Online: Published: 01 May 2004

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      刘文安, 黄如, 张兴. 亚0.1μm栅长CMOS器件和电路的研制[J]. 半导体学报(英文版), 2004, 25(5): 583-588.
      Citation:
      刘文安, 黄如, 张兴. 亚0.1μm栅长CMOS器件和电路的研制[J]. 半导体学报(英文版), 2004, 25(5): 583-588.

      • Received Date: 2015-08-19

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