Chin. J. Semicond. > 2001, Volume 22 > Issue 8 > 1019-1024
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低剂量SIMOX圆片研究

陈猛 , 陈静 , 郑望 , 李林 , 牟海川 , 林梓鑫 , 俞跃辉 and 王曦

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Key words: 低剂量, 硅岛密度, Si/SiO2界面, 线缺陷密度

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    Received: 20 August 2015 Revised: Online: Published: 01 August 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(8): 1019-1024
      陈猛, 陈静, 郑望, 李林, 牟海川, 林梓鑫, 俞跃辉, 王曦. 低剂量SIMOX圆片研究[J]. 半导体学报(英文版), 2001, 22(8): 1019-1024.
      Citation:
      陈猛, 陈静, 郑望, 李林, 牟海川, 林梓鑫, 俞跃辉, 王曦. 低剂量SIMOX圆片研究[J]. 半导体学报(英文版), 2001, 22(8): 1019-1024.
      shu

      • Received Date: 2015-08-20

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