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One-dimensional charged domain walls in fluorite ferroelectrics

Jiajia Chen1, 2, Haoji Qian1, 2, , Xiaoxi Li1, 2, Yan Liu1, 2, Chengji Jin1, 2, and Genquan Han1, 2

+ Author Affiliations

 Corresponding author: Haoji Qian, hjqian@xidain.edu.cn; Chengji Jin, cjjin@xidian.edu.cn

DOI: 10.1088/1674-4926/26020026CSTR: 32376.14.1674-4926.26020026

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[1]
Catalan G, Seidel J, Ramesh R, et al. Domain wall nanoelectronics. Rev Mod Phys, 2012, 84(1): 119 doi: 10.1103/RevModPhys.84.119
[2]
Bednyakov P S, Sturman B I, Sluka T, et al. Physics and applications of charged domain walls. npj Comput Mater, 2018, 4: 65 doi: 10.1038/s41524-018-0121-8
[3]
Meier D. Functional domain walls in multiferroics. J Phys: Condens Matter, 2015, 27(46): 463003 doi: 10.1088/0953-8984/27/46/463003
[4]
Zhong H, Wang S Y, Zhang Q H, et al. Observation of one-dimensional, charged domain walls in ferroelectric ZrO2. Science, 2026, 391(6783): 407 doi: 10.1126/science.aeb7280
[5]
Lee H J, Lee M, Lee K, et al. Scale-free ferroelectricity induced by flat phonon bands in HfO2. Science, 369(6509): 1343
[6]
Cheema S S, Kwon D, Shanker N, et al. Enhanced ferroelectricity in ultrathin films grown directly on silicon. Nature, 2020, 580(7804): 478 doi: 10.1038/s41586-020-2208-x
[7]
Jia C L, Mi S B, Urban K, et al. Atomic-scale study of electric dipoles near charged and uncharged domain walls in ferroelectric films. Nat Mater, 2008, 7(1): 57 doi: 10.1038/nmat2080
[8]
Nukala P, Ahmadi M, Wei Y F, et al. Reversible oxygen migration and phase transitions in hafnia-based ferroelectric devices. Science, 2021, 372(6542): 630 doi: 10.1126/science.abf3789
[9]
Noheda B, Nukala P, Acuautla M. Lessons from hafnium dioxide-based ferroelectrics. Nat Mater, 2023, 22(5): 562 doi: 10.1038/s41563-023-01507-2
Fig. 1.  (Color online) Schematic of (a) 2D and (b) 1D neutral and charged DWs in ferroelectric materials. (c) Atomic schematic of fluorite ferroelectrics (Hf/ZrO2) with defined 1D CDWs. Projected multislice electron ptychography (MEP) phase image containing (d) three H-H CDWs and (e) three T-T CDWs. (f to h) Atomic integrated differential phase contrast scanning transmission electron microscopy (iDPC-STEM) frames at three states during CDWs motion. The white dashed boxes mark the CDW positions and the arrows indicate the directions of the CDW motion. (i to k) Atomic models and polarization mappings corresponding to (f) to (h)[4].

[1]
Catalan G, Seidel J, Ramesh R, et al. Domain wall nanoelectronics. Rev Mod Phys, 2012, 84(1): 119 doi: 10.1103/RevModPhys.84.119
[2]
Bednyakov P S, Sturman B I, Sluka T, et al. Physics and applications of charged domain walls. npj Comput Mater, 2018, 4: 65 doi: 10.1038/s41524-018-0121-8
[3]
Meier D. Functional domain walls in multiferroics. J Phys: Condens Matter, 2015, 27(46): 463003 doi: 10.1088/0953-8984/27/46/463003
[4]
Zhong H, Wang S Y, Zhang Q H, et al. Observation of one-dimensional, charged domain walls in ferroelectric ZrO2. Science, 2026, 391(6783): 407 doi: 10.1126/science.aeb7280
[5]
Lee H J, Lee M, Lee K, et al. Scale-free ferroelectricity induced by flat phonon bands in HfO2. Science, 369(6509): 1343
[6]
Cheema S S, Kwon D, Shanker N, et al. Enhanced ferroelectricity in ultrathin films grown directly on silicon. Nature, 2020, 580(7804): 478 doi: 10.1038/s41586-020-2208-x
[7]
Jia C L, Mi S B, Urban K, et al. Atomic-scale study of electric dipoles near charged and uncharged domain walls in ferroelectric films. Nat Mater, 2008, 7(1): 57 doi: 10.1038/nmat2080
[8]
Nukala P, Ahmadi M, Wei Y F, et al. Reversible oxygen migration and phase transitions in hafnia-based ferroelectric devices. Science, 2021, 372(6542): 630 doi: 10.1126/science.abf3789
[9]
Noheda B, Nukala P, Acuautla M. Lessons from hafnium dioxide-based ferroelectrics. Nat Mater, 2023, 22(5): 562 doi: 10.1038/s41563-023-01507-2
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    Received: 09 February 2026 Revised: Online: Accepted Manuscript: 09 March 2026

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      Jiajia Chen, Haoji Qian, Xiaoxi Li, Yan Liu, Chengji Jin, Genquan Han. One-dimensional charged domain walls in fluorite ferroelectrics[J]. Journal of Semiconductors, 2026, In Press. doi: 10.1088/1674-4926/26020026 ****J J Chen, H J Qian, X X Li, Y Liu, C J Jin, and G Q Han, One-dimensional charged domain walls in fluorite ferroelectrics[J]. J. Semicond., 2026, accepted doi: 10.1088/1674-4926/26020026
      Citation:
      Jiajia Chen, Haoji Qian, Xiaoxi Li, Yan Liu, Chengji Jin, Genquan Han. One-dimensional charged domain walls in fluorite ferroelectrics[J]. Journal of Semiconductors, 2026, In Press. doi: 10.1088/1674-4926/26020026 ****
      J J Chen, H J Qian, X X Li, Y Liu, C J Jin, and G Q Han, One-dimensional charged domain walls in fluorite ferroelectrics[J]. J. Semicond., 2026, accepted doi: 10.1088/1674-4926/26020026

      One-dimensional charged domain walls in fluorite ferroelectrics

      DOI: 10.1088/1674-4926/26020026
      CSTR: 32376.14.1674-4926.26020026
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      • Jiajia Chen received her Ph. D. degree from the Zhejiang University, China, in 2019. She is currently an Associate professor with the Hangzhou Institute of Technology, Xidian University, China. Her current research interests include advanced CMOS and emerging nonvolatile memory technologies, particularly ferroelectric devices, for computing-in-memory applications
      • Haoji Qian received his doctoral degree from the Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, in 2022. He is currently a postdoctoral researcher at Xidian University. His research interests include ferroelectric materials and devices
      • Xiaoxi Li obtained her undergraduate degree from the Department of Microelectronics at Xidian University and received her Ph.D. in Microelectronics from Fudan University. After completing her Ph.D., she continued her research at Xidian University. Her research interests include novel ferroelectric devices and applications
      • Chengji Jin received the Ph.D. degree from the University of Tokyo, Tokyo, Japan, in 2020. He is currently an Associate professor with the Hangzhou Institute of Technology, Xidian University, China. His current research interests include advanced CMOS technologies and emerging nonvolatile memory technologies
      • Corresponding author: hjqian@xidain.edu.cncjjin@xidian.edu.cn
      • Received Date: 2026-02-09
        Available Online: 2026-03-09

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