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Journal of Semiconductors
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2026
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| Citation: |
Ruilin Mao, Peng Gao. Atomic scale probing and engineering of interface phonons[J]. Journal of Semiconductors, 2026, In Press. doi: 10.1088/1674-4926/26020034
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R Mao and P Gao, Atomic scale probing and engineering of interface phonons[J]. J. Semicond., 2026, accepted doi: 10.1088/1674-4926/26020034
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Atomic scale probing and engineering of interface phonons
DOI: 10.1088/1674-4926/26020034
CSTR: 32376.14.1674-4926.26020034
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References
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Proportional views



Ruilin Mao received his bachelor’s degree in Materials Physics from Harbin Institute of Technology in 2022. He is currently a doctoral student at the School of Physics, Peking University, under the supervision of Prof. Peng Gao. His current research focuses on using electron microscopy techniques to investigate thermal transport behavior in materials.
Peng Gao is a Boya Distinguished Professor at Peking University, a recipient of the National Science Fund for Distinguished Young Scholars, and Chief Scientist of the National Key Research and Development Program. He earned his Ph.D. in Condensed Matter Physics from the Institute of Physics, Chinese Academy of Sciences, and conducted research at the University of Michigan, Brookhaven National Laboratory, and the University of Tokyo. His research focuses on atomic-scale interface science. He has published over 300 papers and has been repeatedly recognized as a Highly Cited Researcher.
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