| Citation: |
Yiwen Bian, Minghang Fan, Tianxing Wang, Caixia Guo. Reconfigurable Schottky-barriers in 2D photodiodes via room-temperature Ozone treatment[J]. Journal of Semiconductors, 2026, In Press. doi: 10.1088/1674-4926/26030046
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Y W Bian, M H Fan, T X Wang, and C X Guo, Reconfigurable Schottky-barriers in 2D photodiodes via room-temperature Ozone treatment[J]. J. Semicond., 2026, accepted doi: 10.1088/1674-4926/26030046
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Reconfigurable Schottky-barriers in 2D photodiodes via room-temperature Ozone treatment
DOI: 10.1088/1674-4926/26030046
CSTR: 32376.14.1674-4926.26030046
More Information-
Abstract
The integration of two-dimensional (2D) semiconductors with mainstream complementary metal-oxide-semiconductor (CMOS) technology is hampered by the limited ability to adjust device performance after fabrication. Here, we present a differential Schottky-barrier tuning strategy to post-customize the optoelectronic performance based on a two-dimensional asymmetric Schottky contact WSe2 photodiode, eliminating the need for device re-fabrication. A brief, room-temperature ozone exposure (1.5 min) enables in-situ tuning of the rectification ratio across three orders of magnitude (from 102 to 105) and enhances the peak responsivity at 532 nm by 11.2 times. These effects stem from differential modulation of Schottky barrier height (SBH) at the asymmetric contacts. While the SBH at the WSe2/Au interface is reduced, the SBH at the WSe2/graphene junction is elevated, a phenomenon unlocked by the combination of oxidation-induced Fermi-level lowering in WSe2 and interfacial dipole modification. Our method establishes a "device-after-design" paradigm for 2D material engineering, providing a CMOS-compatible and versatile route toward adaptive optoelectronics for applications in wearable sensing and reconfigurable photonic systems. -
References
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Proportional views



Yiwen Bian Bian Yiwen, an undergraduate student of the 2024 batch, is currently studying in the School of International Education at Henan Normal University, majoring in Electrical Engineering and Automation.
Caixia Guo was born in Yucheng, Henan, China, in 1979. She received the M.S. degree from Nanjing University of Science and Technology, Nanjing, China, in 2005 and the Ph.D. degree from Henan Normal University, Xinxiang, China, in 2018. She is currently an Associate Professor with Henan Normal University, Xinxiang. Her current research interests include 2D semiconductor materials and devices.
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