1 |
Steady-state solution growth of microcrystalline silicon on nanocrystalline seed layers on glass
R. Bansen, C. Ehlers, Th. Teubner, T. Boeck
Journal of Semiconductors, 2016, 37(9): 093001. doi: 10.1088/1674-4926/37/9/093001
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2 |
Influences of ICP etching damages on the electronic properties of metal field plate 4H-SiC Schottky diodes
Hui Wang, Yingxi Niu, Fei Yang, Yong Cai, Zehong Zhang, et al.
Journal of Semiconductors, 2015, 36(10): 104006. doi: 10.1088/1674-4926/36/10/104006
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3 |
An improved analytical model of 4H-SiC MESFET incorporating bulk and interface trapping effects
M. Hema Lata Rao, N. V. L. Narasimha Murty
Journal of Semiconductors, 2015, 36(1): 014004. doi: 10.1088/1674-4926/36/1/014004
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4 |
Effect of tunneling current on the noise characteristics of a 4H-SiC Read Avalanche diode
Deepak K. Karan, Pranati Panda, G. N. Dash
Journal of Semiconductors, 2013, 34(1): 014001. doi: 10.1088/1674-4926/34/1/014001
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5 |
Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode
Chen Fengping, Zhang Yuming, Lü Hongliang, Zhang Yimen, Guo Hui, et al.
Journal of Semiconductors, 2011, 32(6): 064003. doi: 10.1088/1674-4926/32/6/064003
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6 |
Effect of annealing process on the surface roughness in multiple Al implanted 4H-SiC
Wu Hailei, Sun Guosheng, Yang Ting, Yan Guoguo, Wang Lei, et al.
Journal of Semiconductors, 2011, 32(7): 072002. doi: 10.1088/1674-4926/32/7/072002
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7 |
High-quality homoepitaxial layers grown on 4H-SiC at a high growth rate by vertical LPCVD
Wu Hailei, Sun Guosheng, Yang Ting, Yan Guoguo, Wang Lei, et al.
Journal of Semiconductors, 2011, 32(4): 043005. doi: 10.1088/1674-4926/32/4/043005
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8 |
High temperature characterization of double base epilayer 4H-SiC BJTs
Zhang Qian, Zhang Yuming, Zhang Yimen, Wang Yuehu
Journal of Semiconductors, 2010, 31(11): 114005. doi: 10.1088/1674-4926/31/11/114005
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9 |
Optimized design of 4H-SiC floating junction power Schottky barrier diodes
Pu Hongbin, Cao Lin, Chen Zhiming, Ren Jie
Journal of Semiconductors, 2009, 30(4): 044001. doi: 10.1088/1674-4926/30/4/044001
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10 |
TDDB improvement by optimized processes on metal–insulator–silicon capacitors with atomic layer deposition of Al2O3 and multi layers of TiN film structure
Peng Kun, Wang Biao, Xiao Deyuan, Qiu Shengfen, Lin D C, et al.
Journal of Semiconductors, 2009, 30(8): 082005. doi: 10.1088/1674-4926/30/8/082005
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11 |
Analysis of Early Voltage in 4H-SiC BJTs
Han Ru, Li Cong, Yang Yintang, Jia Hujun
Chinese Journal of Semiconductors , 2007, 28(9): 1433-1437.
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12 |
Ohmic Contact Properties of Multi-Metal Films on n-Type 4H-SiC
Han Ru, Yang Yintang, Wang Ping, Cui Zhandong, Li Liang, et al.
Chinese Journal of Semiconductors , 2007, 28(2): 149-153.
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13 |
Epitaxial Growth of 4H-SiC MESFET Structures
Li Zheyang, Dong Xun, Bai Song, Chen Gang, Chen Tangsheng, et al.
Chinese Journal of Semiconductors , 2007, 28(S1): 379-381.
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14 |
4H-SiC MESFET Device Process
Chen Gang, Bai Song, Zhang Tao, Wang Hao, Li Zheyang, et al.
Chinese Journal of Semiconductors , 2007, 28(S1): 565-567.
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15 |
Characteristics of Vanadium Ion-Implanted Layer of 4H-SiC
Wang Chao, Zhang Yuming, Zhang Yimen
Chinese Journal of Semiconductors , 2006, 27(S1): 120-123.
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16 |
Characteristics of Semi-Insulating 4H-SiC Layers by Vanadium Ion Implantation
Wang Chao, Zhang Yuming, Zhang Yimen
Chinese Journal of Semiconductors , 2006, 27(8): 1396-1400.
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17 |
Electrical Characteristics of n-Type 4H-SiC MOS Capacitor
Ning Jin, Liu Zhongli, Gao Jiantou
Chinese Journal of Semiconductors , 2005, 26(S1): 140-142.
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18 |
Anealing Effect on Cu/ Ni/4H-SiC Schottky Barrier
Yang Weifeng, Yang Keqin, Chen Xiaping, Zhang Feng, Wang Liangjun, et al.
Chinese Journal of Semiconductors , 2005, 26(S1): 277-280.
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19 |
LPCVD Homoepitaxial Growth on Off-Axis Si-Face 4H-SiC(0001) Substrates
Wang Lei, Sun Guosheng, Gao Xin, Zhao Wanshun, Zhang Yongxing, et al.
Chinese Journal of Semiconductors , 2005, 26(S1): 113-116.
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20 |
Homoepitaxial Growth and Properties of 4H-SiC by Chemical Vapor Deposition
Gao Xin, Sun Guosheng, Li Jinmin, Zhao Wanshun, Wang Lei, et al.
Chinese Journal of Semiconductors , 2005, 26(S1): 70-73.
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