Citation: |
Chen Fengping, Zhang Yuming, Lü Hongliang, Zhang Yimen, Guo Hui, Guo Xin. Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode[J]. Journal of Semiconductors, 2011, 32(6): 064003. doi: 10.1088/1674-4926/32/6/064003
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Chen F P, Zhang Y M, Lü H L, Zhang Y M, Guo H, Guo X. Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode[J]. J. Semicond., 2011, 32(6): 064003. doi: 10.1088/1674-4926/32/6/064003.
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Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode
DOI: 10.1088/1674-4926/32/6/064003
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Abstract
4H-SiC junction barrier Schottky (JBS) diodes with four kinds of design have been fabricated and characterized using two different processes in which one is fabricated by making the P-type ohmic contact of the anode independently, and the other is processed by depositing a Schottky metal multi-layer on the whole anode. The reverse performances are compared to find the influences of these factors. The results show that JBS diodes with field guard rings have a lower reverse current density and a higher breakdown voltage, and with independent P-type ohmic contact manufacturing, the reverse performance of 4H-SiC JBS diodes can be improved effectively. Furthermore, the P-type ohmic contact is studied in this work.-
Keywords:
- 4H-SiC
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References
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