Chin. J. Semicond. > 2000, Volume 21 > Issue 9 > 898-903

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Key words: CMOS, 运算放大器, 电离辐射效应, 氧化物电存, 界面态

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    Received: 20 August 2015 Revised: Online: Published: 01 September 2000

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      任迪远, 陆妩, 郭旗, 余学锋, 严荣良, 胡浴红, 王明刚, 赵元富. 不同结构CMOS运算放大器电路的电离辐射效应[J]. 半导体学报(英文版), 2000, 21(9): 898-903.
      Citation:
      任迪远, 陆妩, 郭旗, 余学锋, 严荣良, 胡浴红, 王明刚, 赵元富. 不同结构CMOS运算放大器电路的电离辐射效应[J]. 半导体学报(英文版), 2000, 21(9): 898-903.

      • Received Date: 2015-08-20

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