Chin. J. Semicond. > 2003, Volume 24 > Issue 10 > 1109-1114
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Al_2O_3栅介质的制备工艺及其泄漏电流输运机制

任驰 , 杨红 , 韩德栋 , 康晋锋 , 刘晓彦 and 韩汝琦

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Key words: Al2O3栅介质, 泄漏电流输运机制, Schottky发射, Frenkel-Poole发射

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(10): 1109-1114
      任驰, 杨红, 韩德栋, 康晋锋, 刘晓彦, 韩汝琦. Al_2O_3栅介质的制备工艺及其泄漏电流输运机制[J]. 半导体学报(英文版), 2003, 24(10): 1109-1114.
      Citation:
      任驰, 杨红, 韩德栋, 康晋锋, 刘晓彦, 韩汝琦. Al_2O_3栅介质的制备工艺及其泄漏电流输运机制[J]. 半导体学报(英文版), 2003, 24(10): 1109-1114.
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      • Received Date: 2015-08-20

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