Chin. J. Semicond. > 2003, Volume 24 > Issue 10 > 1109-1114
|

CONTENTS

Al_2O_3栅介质的制备工艺及其泄漏电流输运机制

任驰 , 杨红 , 韩德栋 , 康晋锋 , 刘晓彦 and 韩汝琦

+ Author Affiliations

PDF

Key words: Al2O3栅介质, 泄漏电流输运机制, Schottky发射, Frenkel-Poole发射

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2449 Times PDF downloads: 975 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 October 2003

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2003  >  24(10): 1109-1114
      任驰, 杨红, 韩德栋, 康晋锋, 刘晓彦, 韩汝琦. Al_2O_3栅介质的制备工艺及其泄漏电流输运机制[J]. 半导体学报(英文版), 2003, 24(10): 1109-1114.
      Citation:
      任驰, 杨红, 韩德栋, 康晋锋, 刘晓彦, 韩汝琦. Al_2O_3栅介质的制备工艺及其泄漏电流输运机制[J]. 半导体学报(英文版), 2003, 24(10): 1109-1114.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return