Chin. J. Semicond. > 1983, Volume 4 > Issue 6 > 526-530
|

CONTENTS

原生掺Si砷化镓单晶微缺陷的研究

何宏家 , 曹福年 , 范缇文 , 白玉珂 , 费雪英 , 王凤莲 and 褚一鸣

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2290 Times PDF downloads: 770 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 June 1983

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1983  >  4(6): 526-530
      何宏家, 曹福年, 范缇文, 白玉珂, 费雪英, 王凤莲, 褚一鸣. 原生掺Si砷化镓单晶微缺陷的研究[J]. 半导体学报(英文版), 1983, 4(6): 526-530.
      Citation:
      何宏家, 曹福年, 范缇文, 白玉珂, 费雪英, 王凤莲, 褚一鸣. 原生掺Si砷化镓单晶微缺陷的研究[J]. 半导体学报(英文版), 1983, 4(6): 526-530.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return