Chin. J. Semicond. > 2004, Volume 25 > Issue 8 > 972-975

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Key words: 离子束淀积, X射线衍射, GdSi

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    Received: 19 August 2015 Revised: Online: Published: 01 August 2004

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      李艳丽, 陈诺夫, 周剑平, 宋书林, 杨少延, 刘志凯. 离子束淀积方法制备GdSi_2薄膜[J]. 半导体学报(英文版), 2004, 25(8): 972-975.
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      李艳丽, 陈诺夫, 周剑平, 宋书林, 杨少延, 刘志凯. 离子束淀积方法制备GdSi_2薄膜[J]. 半导体学报(英文版), 2004, 25(8): 972-975.

      • Received Date: 2015-08-19

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