Chin. J. Semicond. > 1990, Volume 11 > Issue 2 > 127-135
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应用于VLSI的PSSWS-LDD MOSFET优化工艺研究

徐大林 , 王方 , 李荫波 , 彭忠献 and 黄敬

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(2): 127-135
      徐大林, 王方, 李荫波, 彭忠献, 黄敬. 应用于VLSI的PSSWS-LDD MOSFET优化工艺研究[J]. 半导体学报(英文版), 1990, 11(2): 127-135.
      Citation:
      徐大林, 王方, 李荫波, 彭忠献, 黄敬. 应用于VLSI的PSSWS-LDD MOSFET优化工艺研究[J]. 半导体学报(英文版), 1990, 11(2): 127-135.
      shu

      • Received Date: 2015-08-19

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