Chin. J. Semicond. > 1995, Volume 16 > Issue 7 > 491-496
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Si_（0．5）Ge_（0．5）合金的热氧化物的研究

邢益荣，崔玉德，殷士端，张敬平，李侠，朱沛然，徐田冰

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    Received: 19 August 2015 Revised: Online: Published: 01 July 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(7): 491-496
      邢益荣，崔玉德，殷士端，张敬平，李侠，朱沛然，徐田冰. Si_（0．5）Ge_（0．5）合金的热氧化物的研究[J]. 半导体学报(英文版), 1995, 16(7): 491-496.
      Citation:
      邢益荣，崔玉德，殷士端，张敬平，李侠，朱沛然，徐田冰. Si_（0．5）Ge_（0．5）合金的热氧化物的研究[J]. 半导体学报(英文版), 1995, 16(7): 491-496.
      shu

      • Received Date: 2015-08-19

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