Chin. J. Semicond. > 1990, Volume 11 > Issue 11 > 881-885
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钨在硅和氮化钛上的激光化学汽相沉积实验研究

周一敏 , 孙迭篪 , 李富铭 , 杜元成 and 王海

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    Received: 19 August 2015 Revised: Online: Published: 01 November 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(11): 881-885
      周一敏, 孙迭篪, 李富铭, 杜元成, 王海. 钨在硅和氮化钛上的激光化学汽相沉积实验研究[J]. 半导体学报(英文版), 1990, 11(11): 881-885.
      Citation:
      周一敏, 孙迭篪, 李富铭, 杜元成, 王海. 钨在硅和氮化钛上的激光化学汽相沉积实验研究[J]. 半导体学报(英文版), 1990, 11(11): 881-885.
      shu

      • Received Date: 2015-08-19

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