Chin. J. Semicond. > 1996, Volume 17 > Issue 11 > 846-851
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制备参数和退火对a－C∶H膜光学性质的影响

陈光华，卢阳华

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    Received: 18 August 2015 Revised: Online: Published: 01 November 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(11): 846-851
      陈光华，卢阳华. 制备参数和退火对a－C∶H膜光学性质的影响[J]. 半导体学报(英文版), 1996, 17(11): 846-851.
      Citation:
      陈光华，卢阳华. 制备参数和退火对a－C∶H膜光学性质的影响[J]. 半导体学报(英文版), 1996, 17(11): 846-851.
      shu

      • Received Date: 2015-08-18

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