Chin. J. Semicond. > 1990, Volume 11 > Issue 10 > 804-807

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硅表面溅射氮氧铝膜的实验研究

王德煌 and 郭良

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(10): 804-807
      王德煌, 郭良. 硅表面溅射氮氧铝膜的实验研究[J]. 半导体学报(英文版), 1990, 11(10): 804-807.
      Citation:
      王德煌, 郭良. 硅表面溅射氮氧铝膜的实验研究[J]. 半导体学报(英文版), 1990, 11(10): 804-807.
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      • Received Date: 2015-08-19

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