Chin. J. Semicond. > 1985, Volume 6 > Issue 2 > 123-127
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780℃下液相外延生长周Al_xGa_(1-x)As的生长和掺杂特性

余金中 , 岩井莊八 and 青柳克信

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1985

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      Article Navigation >  Journal of Semiconductors  > 1985  >  6(2): 123-127
      余金中, 岩井莊八, 青柳克信. 780℃下液相外延生长周Al_xGa_(1-x)As的生长和掺杂特性[J]. 半导体学报(英文版), 1985, 6(2): 123-127.
      Citation:
      余金中, 岩井莊八, 青柳克信. 780℃下液相外延生长周Al_xGa_(1-x)As的生长和掺杂特性[J]. 半导体学报(英文版), 1985, 6(2): 123-127.
      shu

      • Received Date: 2015-08-20

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