Chin. J. Semicond. > 1990, Volume 11 > Issue 7 > 561-564

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Er~+注入单晶硅中非晶层晶化过程的TEM研究

严勇 , 王培大 , 胡梅生 , 孙慧龄 , 李齐 and 冯端

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    Received: 19 August 2015 Revised: Online: Published: 01 July 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(7): 561-564
      严勇, 王培大, 胡梅生, 孙慧龄, 李齐, 冯端. Er~+注入单晶硅中非晶层晶化过程的TEM研究[J]. 半导体学报(英文版), 1990, 11(7): 561-564.
      Citation:
      严勇, 王培大, 胡梅生, 孙慧龄, 李齐, 冯端. Er~+注入单晶硅中非晶层晶化过程的TEM研究[J]. 半导体学报(英文版), 1990, 11(7): 561-564.
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      • Received Date: 2015-08-19

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