Chin. J. Semicond. > 1995, Volume 16 > Issue 11 > 826-830
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硅分子束外延中硼δ掺杂生长研究

陈祥君，杨宇，龚大卫，陆昉，王建宝，樊永良，盛篪，孙恒慧

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    Received: 19 August 2015 Revised: Online: Published: 01 November 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(11): 826-830
      陈祥君，杨宇，龚大卫，陆昉，王建宝，樊永良，盛篪，孙恒慧. 硅分子束外延中硼δ掺杂生长研究[J]. 半导体学报(英文版), 1995, 16(11): 826-830.
      Citation:
      陈祥君，杨宇，龚大卫，陆昉，王建宝，樊永良，盛篪，孙恒慧. 硅分子束外延中硼δ掺杂生长研究[J]. 半导体学报(英文版), 1995, 16(11): 826-830.
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      • Received Date: 2015-08-19

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