Chin. J. Semicond. > 1998, Volume 19 > Issue 3 > 161-165

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硅中层错带中空位的电子态

王永良

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(3): 161-165
      王永良. 硅中层错带中空位的电子态[J]. 半导体学报(英文版), 1998, 19(3): 161-165.
      Citation:
      王永良. 硅中层错带中空位的电子态[J]. 半导体学报(英文版), 1998, 19(3): 161-165.
      shu

      • Received Date: 2015-08-20

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