Chin. J. Semicond. > 1980, Volume 1 > Issue 1 > 6-15
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低压化学蒸汽淀积(LPCVD)的计算机模拟

王季陶

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    Received: 20 August 2015 Revised: Online: Published: 01 January 1980

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      Article Navigation >  Journal of Semiconductors  > 1980  >  1(1): 6-15
      王季陶. 低压化学蒸汽淀积(LPCVD)的计算机模拟[J]. 半导体学报(英文版), 1980, 1(1): 6-15.
      Citation:
      王季陶. 低压化学蒸汽淀积(LPCVD)的计算机模拟[J]. 半导体学报(英文版), 1980, 1(1): 6-15.
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      • Received Date: 2015-08-20

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