Chin. J. Semicond. > 1999, Volume 20 > Issue 3 > 242-245
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Si~+注入SiO_2薄膜的三个PL峰及其受RTA的影响

刘世祥 , 刘渝珍 , 伍勇 , 石万全 , 陈志坚 , 韩一琴 , 刘金龙 , 张通和 and 姚德成

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(3): 242-245
      刘世祥, 刘渝珍, 伍勇, 石万全, 陈志坚, 韩一琴, 刘金龙, 张通和, 姚德成. Si~+注入SiO_2薄膜的三个PL峰及其受RTA的影响[J]. 半导体学报(英文版), 1999, 20(3): 242-245.
      Citation:
      刘世祥, 刘渝珍, 伍勇, 石万全, 陈志坚, 韩一琴, 刘金龙, 张通和, 姚德成. Si~+注入SiO_2薄膜的三个PL峰及其受RTA的影响[J]. 半导体学报(英文版), 1999, 20(3): 242-245.
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      • Received Date: 2015-08-20

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