Chin. J. Semicond. > 2001, Volume 22 > Issue 12 > 1497-1500
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一种实用的磷化铟MMIC背面工艺技术(英文)

李拂晓 and 杨乃彬

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Key words: 磷化铟, 通孔, MMIC

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    Received: 20 August 2015 Revised: Online: Published: 01 December 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(12): 1497-1500
      李拂晓, 杨乃彬. 一种实用的磷化铟MMIC背面工艺技术(英文)[J]. 半导体学报(英文版), 2001, 22(12): 1497-1500.
      Citation:
      李拂晓, 杨乃彬. 一种实用的磷化铟MMIC背面工艺技术(英文)[J]. 半导体学报(英文版), 2001, 22(12): 1497-1500.
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      • Received Date: 2015-08-20

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