Chin. J. Semicond. > 2001, Volume 22 > Issue 12 > 1538-1542

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Key words: 硅, 外延生长, CMOS

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    Received: 20 August 2015 Revised: Online: Published: 01 December 2001

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      王启元, 林兰英, 何自强, 龚义元, 蔡田海, 郁元桓, 何龙珠, 高秀峰, 王建华, 邓惠芳. CMOS集成电路用Φ150—200mm外延硅材料[J]. 半导体学报(英文版), 2001, 22(12): 1538-1542.
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      王启元, 林兰英, 何自强, 龚义元, 蔡田海, 郁元桓, 何龙珠, 高秀峰, 王建华, 邓惠芳. CMOS集成电路用Φ150—200mm外延硅材料[J]. 半导体学报(英文版), 2001, 22(12): 1538-1542.

      • Received Date: 2015-08-20

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