Chin. J. Semicond. > 1995, Volume 16 > Issue 10 > 779-782
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用射频偏压溅射制备的具有快速紫外光响应的ZnO薄膜

张德恒

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(10): 779-782
      张德恒. 用射频偏压溅射制备的具有快速紫外光响应的ZnO薄膜[J]. 半导体学报(英文版), 1995, 16(10): 779-782.
      Citation:
      张德恒. 用射频偏压溅射制备的具有快速紫外光响应的ZnO薄膜[J]. 半导体学报(英文版), 1995, 16(10): 779-782.
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      • Received Date: 2015-08-19

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