Chin. J. Semicond. > 1988, Volume 9 > Issue 5 > 544-547
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难熔金属硅化物TiSi_2对硅的接触性能研究

陈存礼 , 张兴 and 彭家腾

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    Received: 19 August 2015 Revised: Online: Published: 01 May 1988

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      Article Navigation >  Journal of Semiconductors  > 1988  >  9(5): 544-547
      陈存礼, 张兴, 彭家腾. 难熔金属硅化物TiSi_2对硅的接触性能研究[J]. 半导体学报(英文版), 1988, 9(5): 544-547.
      Citation:
      陈存礼, 张兴, 彭家腾. 难熔金属硅化物TiSi_2对硅的接触性能研究[J]. 半导体学报(英文版), 1988, 9(5): 544-547.
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      • Received Date: 2015-08-19

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