Citation: |
谢克文, 王晓红, 陈兢, 刘理天. 用于MEMS的选择性形成多孔硅技术的研究[J]. 半导体学报(英文版), 2002, 23(6): 668-672.
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Key words: 多孔硅, 扩散, 牺牲层
Article views: 2381 Times PDF downloads: 1172 Times Cited by: 0 Times
Received: 19 August 2015 Revised: Online: Published: 01 June 2002
Citation: |
谢克文, 王晓红, 陈兢, 刘理天. 用于MEMS的选择性形成多孔硅技术的研究[J]. 半导体学报(英文版), 2002, 23(6): 668-672.
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