Chin. J. Semicond. > 2002, Volume 23 > Issue 6 > 668-672

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Key words: 多孔硅, 扩散, 牺牲层

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    Received: 19 August 2015 Revised: Online: Published: 01 June 2002

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      谢克文, 王晓红, 陈兢, 刘理天. 用于MEMS的选择性形成多孔硅技术的研究[J]. 半导体学报(英文版), 2002, 23(6): 668-672.
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      谢克文, 王晓红, 陈兢, 刘理天. 用于MEMS的选择性形成多孔硅技术的研究[J]. 半导体学报(英文版), 2002, 23(6): 668-672.

      • Received Date: 2015-08-19

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