Chin. J. Semicond. > 1998, Volume 19 > Issue 9 > 641-645

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Co/Si/Ti/Si(100)多层薄膜固相反应异质外延生长CoSi_2薄膜

屈新萍 , 李炳宗 , 茹国平 , 顾志光 , 徐鸿涛 , 莫鸿翔 , 刘京 and 朱剑豪

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    Received: 18 August 2015 Revised: Online: Published: 01 September 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(9): 641-645
      屈新萍, 李炳宗, 茹国平, 顾志光, 徐鸿涛, 莫鸿翔, 刘京, 朱剑豪. Co/Si/Ti/Si(100)多层薄膜固相反应异质外延生长CoSi_2薄膜[J]. 半导体学报(英文版), 1998, 19(9): 641-645.
      Citation:
      屈新萍, 李炳宗, 茹国平, 顾志光, 徐鸿涛, 莫鸿翔, 刘京, 朱剑豪. Co/Si/Ti/Si(100)多层薄膜固相反应异质外延生长CoSi_2薄膜[J]. 半导体学报(英文版), 1998, 19(9): 641-645.
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      • Received Date: 2015-08-18

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