Chin. J. Semicond. > 1989, Volume 10 > Issue 4 > 280-285
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激光等离子体淀积硅薄膜过程动力学研究

董丽芳 , 傅广生 , 李晓苇 , 韩理 , 张连水 and 吕福润

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    Received: 19 August 2015 Revised: Online: Published: 01 April 1989

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      Article Navigation >  Journal of Semiconductors  > 1989  >  10(4): 280-285
      董丽芳, 傅广生, 李晓苇, 韩理, 张连水, 吕福润. 激光等离子体淀积硅薄膜过程动力学研究[J]. 半导体学报(英文版), 1989, 10(4): 280-285.
      Citation:
      董丽芳, 傅广生, 李晓苇, 韩理, 张连水, 吕福润. 激光等离子体淀积硅薄膜过程动力学研究[J]. 半导体学报(英文版), 1989, 10(4): 280-285.
      shu

      • Received Date: 2015-08-19

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