Chin. J. Semicond. > 2003, Volume 24 > Issue 4 > 357-361
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一种基于卷积核用于光刻模拟的计算稀疏空间点光强的方法(英文)

史峥 , 王国雄 , 严晓浪 , 陈志锦 and 高根生

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Key words: 光刻仿真, 光学邻近校正, 卷积核

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    Received: 20 August 2015 Revised: Online: Published: 01 April 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(4): 357-361
      史峥, 王国雄, 严晓浪, 陈志锦, 高根生. 一种基于卷积核用于光刻模拟的计算稀疏空间点光强的方法(英文)[J]. 半导体学报(英文版), 2003, 24(4): 357-361.
      Citation:
      史峥, 王国雄, 严晓浪, 陈志锦, 高根生. 一种基于卷积核用于光刻模拟的计算稀疏空间点光强的方法(英文)[J]. 半导体学报(英文版), 2003, 24(4): 357-361.
      shu

      • Received Date: 2015-08-20

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