Chin. J. Semicond. > 1993, Volume 14 > Issue 7 > 434-438
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Co/Ti/Si三元固相反应形成自对准TiN/CoSi_2复合薄膜

刘平 , 李炳宗 , 顾志光 , 孙臻 , 黄维宁 , 姜国宝 and 卢煊

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    Received: 20 August 2015 Revised: Online: Published: 01 July 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(7): 434-438
      刘平, 李炳宗, 顾志光, 孙臻, 黄维宁, 姜国宝, 卢煊. Co/Ti/Si三元固相反应形成自对准TiN/CoSi_2复合薄膜[J]. 半导体学报(英文版), 1993, 14(7): 434-438.
      Citation:
      刘平, 李炳宗, 顾志光, 孙臻, 黄维宁, 姜国宝, 卢煊. Co/Ti/Si三元固相反应形成自对准TiN/CoSi_2复合薄膜[J]. 半导体学报(英文版), 1993, 14(7): 434-438.
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      • Received Date: 2015-08-20

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