Chin. J. Semicond. > 1981, Volume 2 > Issue 3 > 182-188

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亚微米砷化镓气相双层外延与高阻缓冲层

王永晨 and 朱毅敏

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1981

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      王永晨, 朱毅敏. 亚微米砷化镓气相双层外延与高阻缓冲层[J]. 半导体学报(英文版), 1981, 2(3): 182-188.
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      王永晨, 朱毅敏. 亚微米砷化镓气相双层外延与高阻缓冲层[J]. 半导体学报(英文版), 1981, 2(3): 182-188.

      • Received Date: 2015-08-20

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